Its not a question of coming up to look at my etchings ...... more of a question of what am I doing wrong with my etchings ....
I am etching brass (or attempting to) using a proprietary etch spray on positive resist which is cured under UV with the mask of the job and then developed, when the unmasked etch is supposed to wash away. ...... but doesn't.
All the usual issues of cleanliness and protection against light whilst applying the resist are being adhered to as are the suppliers recommendations for drying resist etc. The variables I have are amount of resist applied (too little/ too much) and the exposure to UV time (wattage/time/distance and possibly wavelength?) .... I use an 8 watt aquarium UV water filter lamp .....and lastly the film on which the image is printed.......it's overhead projector film.
When developed I get the right image defined sharply but the film seems to cast a shadow on the resist and it's this shadow that seems not to wash away when in the developer. Where the film is not covering the resist the resist washes away but not entirely cleanly needing a little encouragement with a very soft artist paint brush. That I can live with but getting the other to shift is impossible and finish with a crisp image.
It all points to the film being the problem but OH projector film is crystal clear so what gives?
All solutions earn nector points!!
Alan