Hi,
I am looking for an insulator which has a much slower etch rate in HF than SiOx. It would be important, that it could be grown either by thermal evaporation or sputter deposition on top of Si0x. Does such a material exist?
Also, does anyone know a good reference where etch rates of materials are listed?
Last question: What happens to Cu and Co in HF?
Thanks a lot!
Barbaros