I have a question about the deposition of very thin (40 nm) silver films on glass, I hope you can give me some idea. I am going to deposit a film like this because I want to do some study on surface plasmons, and I think I need surface roughness < 5 nm. I will do it using thermal evaporation, and I would like to know whether it is better to choose a high or a low deposition speed and whether the glass substrate should be heated or not. I did a bibliographic search on this and the only reference that I found is "Optical characterisation of gold using surface plasmon-polaritons" R A Innes and J R Sambles, J. Phys. F: Met. Phys. 17 (1987) 277-287, which says that they used fast evaporation (60 nm/min^-1) to achieve roughness < 1 nm. Also I did a search on the newsgroup using Google groups and I think that this kind of question has not yet appeared in the ng. Could someone maybe give me some reference to read?
Thanks very much in advance, Giovanni