pulsed laser deposition of thin oxide films

I intend to buy a pulsed laser depostion (PLD) setup to deposit thin ceramic films. By reading the litterature it seems that a lot of people use KrF lasers with a wavelength of 248nm. However using a solid-state Nd:YAG laser whose frequency is quadrupled (1064nm down to 266nm) seems to be also possible. What are the pros and the cons concerning the use of a KrF gas laser and a Nd:YAG solid-state laser to work around 250nm for deposition of thin oxide films? Thanks in advance for your help and for sharing your experience of PLD :D Souiss

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